is a kind of glass-ceramic in boron-aluminium-silicon system. It has
such trait as resist high temperature, high intensity, temperature
shock resistance and excellent electronic property.
The boron source produced by our company is classified into PWB1 (low
boron) and PWB2 (high boron) which is applied in the semiconductor
components and boron doping source of LIC (large integrate circuit)
fabrication. The boron doping source has such advantage as high stability,
high uniformity, high repeatability, high consistency and long life
time. Our company is the only boron doping source company in China.
The product has awarded “national science technology progress third
class”. Our product has the similar advantage from abroad, while the
price has great advantage; as a result our product has been used by
a lot famous company.